Shares of CVD Equipment Corporation (NASDAQ:CVV – Get Free Report) crossed above its 200-day moving average during trading on Monday . The stock has a 200-day moving average of $5.56 and traded as high as $8.14. CVD Equipment shares last traded at $7.89, with a volume of 192,574 shares trading hands.
Wall Street Analysts Forecast Growth
Separately, Weiss Ratings restated a “sell (d-)” rating on shares of CVD Equipment in a report on Friday, June 5th. One investment analyst has rated the stock with a Sell rating, Based on data from MarketBeat, the stock has an average rating of “Sell”.
Check Out Our Latest Stock Report on CVV
CVD Equipment Price Performance
Institutional Inflows and Outflows
Large investors have recently bought and sold shares of the company. Renaissance Technologies LLC boosted its position in CVD Equipment by 17.5% in the 1st quarter. Renaissance Technologies LLC now owns 180,882 shares of the industrial products company’s stock valued at $749,000 after buying an additional 27,000 shares during the last quarter. Dimensional Fund Advisors LP raised its position in shares of CVD Equipment by 5.2% during the third quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock worth $241,000 after acquiring an additional 3,556 shares during the last quarter. Citadel Advisors LLC raised its position in shares of CVD Equipment by 93.6% during the third quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock worth $139,000 after acquiring an additional 20,011 shares during the last quarter. FNY Investment Advisers LLC acquired a new position in shares of CVD Equipment during the second quarter valued at $305,000. Finally, DRW Securities LLC acquired a new position in shares of CVD Equipment during the fourth quarter valued at $45,000. Institutional investors and hedge funds own 31.59% of the company’s stock.
About CVD Equipment
CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.
The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.
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