Shares of CVD Equipment Corporation (NASDAQ:CVV – Get Free Report) passed above its 200-day moving average during trading on Monday . The stock has a 200-day moving average of $4.74 and traded as high as $8.20. CVD Equipment shares last traded at $7.87, with a volume of 138,862 shares changing hands.
Analyst Upgrades and Downgrades
CVV has been the subject of several research reports. Weiss Ratings reiterated a “sell (d-)” rating on shares of CVD Equipment in a research note on Friday, June 5th. Wall Street Zen cut CVD Equipment from a “hold” rating to a “sell” rating in a report on Saturday, April 4th. One analyst has rated the stock with a Sell rating, According to MarketBeat.com, the company presently has an average rating of “Sell”.
Check Out Our Latest Stock Analysis on CVV
CVD Equipment Stock Down 3.8%
Institutional Trading of CVD Equipment
Several hedge funds and other institutional investors have recently bought and sold shares of CVV. DRW Securities LLC purchased a new stake in shares of CVD Equipment in the 4th quarter worth $45,000. Citadel Advisors LLC raised its holdings in shares of CVD Equipment by 93.6% in the third quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock valued at $139,000 after acquiring an additional 20,011 shares in the last quarter. Dimensional Fund Advisors LP lifted its stake in CVD Equipment by 5.2% in the third quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock worth $241,000 after acquiring an additional 3,556 shares during the period. Finally, Renaissance Technologies LLC grew its holdings in CVD Equipment by 17.5% during the 1st quarter. Renaissance Technologies LLC now owns 180,882 shares of the industrial products company’s stock worth $749,000 after acquiring an additional 27,000 shares in the last quarter. Hedge funds and other institutional investors own 31.59% of the company’s stock.
About CVD Equipment
CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.
The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.
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