CVD Equipment Corporation (NASDAQ:CVV – Get Free Report) was the recipient of a significant decrease in short interest in the month of February. As of February 13th, there was short interest totaling 29,381 shares, a decrease of 14.7% from the January 29th total of 34,437 shares. Based on an average daily trading volume, of 69,325 shares, the days-to-cover ratio is currently 0.4 days. Currently, 0.6% of the company’s shares are short sold. Currently, 0.6% of the company’s shares are short sold. Based on an average daily trading volume, of 69,325 shares, the days-to-cover ratio is currently 0.4 days.
Analysts Set New Price Targets
Separately, Weiss Ratings restated a “sell (e+)” rating on shares of CVD Equipment in a research report on Wednesday, January 21st. One research analyst has rated the stock with a Sell rating, According to MarketBeat, the company presently has a consensus rating of “Sell”.
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CVD Equipment Stock Performance
Institutional Trading of CVD Equipment
Large investors have recently bought and sold shares of the business. Dimensional Fund Advisors LP raised its holdings in CVD Equipment by 5.2% during the 3rd quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock worth $241,000 after buying an additional 3,556 shares during the period. Citadel Advisors LLC boosted its holdings in shares of CVD Equipment by 93.6% in the third quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock valued at $139,000 after buying an additional 20,011 shares during the period. Finally, DRW Securities LLC bought a new stake in shares of CVD Equipment during the fourth quarter worth $45,000. 31.59% of the stock is owned by institutional investors.
CVD Equipment Company Profile
CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.
The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.
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