CVD Equipment (NASDAQ:CVV) Stock Crosses Above 200-Day Moving Average – Here’s What Happened

CVD Equipment Corporation (NASDAQ:CVV) shares crossed above its 200-day moving average during trading on Monday . The stock has a 200-day moving average of $3.88 and traded as high as $4.94. CVD Equipment shares last traded at $4.82, with a volume of 167,434 shares changing hands.

Analyst Ratings Changes

Several brokerages have weighed in on CVV. Wall Street Zen cut shares of CVD Equipment from a “hold” rating to a “sell” rating in a research report on Saturday, April 4th. Weiss Ratings reissued a “sell (e+)” rating on shares of CVD Equipment in a research report on Wednesday, January 21st. One analyst has rated the stock with a Sell rating, Based on data from MarketBeat.com, the stock currently has an average rating of “Sell”.

CVD Equipment Trading Up 22.3%

The stock’s fifty day moving average price is $4.16 and its 200 day moving average price is $3.91. The stock has a market cap of $40.39 million, a P/E ratio of -26.45 and a beta of 0.95.

Institutional Inflows and Outflows

Large investors have recently bought and sold shares of the business. DRW Securities LLC bought a new stake in shares of CVD Equipment in the fourth quarter worth approximately $45,000. Citadel Advisors LLC grew its stake in shares of CVD Equipment by 93.6% in the third quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock worth $139,000 after acquiring an additional 20,011 shares during the period. Finally, Dimensional Fund Advisors LP grew its stake in shares of CVD Equipment by 5.2% in the third quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock worth $241,000 after acquiring an additional 3,556 shares during the period. 31.59% of the stock is owned by hedge funds and other institutional investors.

About CVD Equipment

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.